Methods of forming patterns for semiconductor device structures

ABSTRACT

Methods of forming a pattern in a semiconductor device structure include deprotecting an outer portion of a first photosensitive resist material, forming a second photosensitive resist material, exposing portions of the first and second photosensitive resist materials to radiation, and removing the deprotected outer portion of the first photosensitive resist material and the exposed portions of the first and second photosensitive resist materials. Additional methods include forming a first resist material over a substrate to include a first portion and a relatively thicker second portion, deprotecting substantially the entire first portion and an outer portion of the second portion while leaving an inner portion of the second portion protected, and forming a second resist material over the substrate. A portion of the second resist material is exposed to radiation, and deprotected and exposed portions of the first and second resist materials are removed.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.13/746,543, filed Jan. 22, 2013, now U.S. Pat. No. 9,213,239, issuedDec. 15, 2015, the disclosure of which is hereby incorporated herein inits entirety by this reference.

FIELD

Embodiments of the present disclosure relate to methods of semiconductorprocessing, such as forming a two-dimensional pattern of at least onematerial to define at least one structure for a semiconductor device.

BACKGROUND

As semiconductor device features are reduced in size, conventionalprocessing techniques (e.g., photolithography) are unable to directlymeet the size requirements. The concept of pitch can be used to describethe sizes of features of a semiconductor device. Pitch may be defined asa distance between an identical point in two adjacent features when thepattern includes repeating features, as in arrays. These features areconventionally separated by spaces between adjacent features, whichspaces are subsequently filled by a material, such as an insulator. As aresult, pitch can be viewed as the sum of the width of a feature and ofthe width of the space on one side of the feature separating thatfeature from the adjacent feature. However, due to factors such asoptics and radiation wavelength, photolithography techniques have aminimum pitch below which a particular photolithographic techniquecannot reliably form features. Thus, the minimum pitch of aphotolithographic technique is an obstacle to continued feature sizereduction.

“Pitch doubling” or “pitch multiplication” is a technique that may beused to form features smaller than is possible by conventionalphotolithography technology. While pitch is actually reduced by thistechnique, the reduction in pitch is conventionally referred to as“pitch doubling” or, more generally, “pitch multiplication.” Thus,conventionally, “multiplication” of pitch by a certain factor actuallyinvolves reducing the pitch by that factor. The conventional terminologyis retained herein.

In one method of pitch doubling, a feature is formed by conventionalphotolithography and a spacer is formed on sidewalls of the feature.Material from the spacer is removed from horizontal surfaces (e.g., atop of the feature, a floor of a space between adjacent features),leaving the spacers only along the sidewalls of the feature. The featureis removed, leaving two spacers for every one feature originally formedby photolithography (e.g., one spacer on each of two opposing sidewallsof the feature). The spacers form a pattern, which is transferred intoan underlying material. Material underlying the spacers is retained,while material underlying an area between the spacers is removed to formfeatures under each spacer in a desired pattern. Alternatively oradditionally, material may be formed (e.g., deposited) between thespacers, between features underlying the spacers, or within gaps andtrenches formed under the spacers. Thus, a number of features canessentially be doubled in a given area, compared to conventionalphotolithography techniques.

If a metal pattern is formed by disposing a metal material within gapsand trenches formed under the spacers, the metal material may besubjected to an abrasive removal process (e.g., chemical-mechanicalpolishing (CMP)) to remove excess metal material. Such a process maycause so-called “dishing” in larger metal features, such as metal pads,in which central portions of the larger metal features are thinner thanperipheral portions thereof. Dishing can lead to reliability issues andeven failures of devices incorporating structures resulting from such aprocess.

Pitch doubling techniques involve an undesirable number of process actsto arrive at a final pattern. Alternative, improved methods forfabricating features of dimensions below resolution limits ofphotolithography are desirable.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A through 8B illustrate a method of fainting a pattern in asemiconductor device structure according to an embodiment of the presentdisclosure.

FIG. 1A is a partial cross-sectional side view of a semiconductor devicestructure according to an embodiment of the present disclosure.

FIG. 1B is a partial cross-sectional top view of the semiconductordevice structure of FIG. 1A, taken along section line 1B-1B of FIG. 1A.

FIG. 2 is a partial cross-sectional side view of the semiconductordevice structure of FIG. 1A showing an acid solution disposed over andaround a first resist material.

FIG. 3 is a partial cross-sectional side view of the semiconductordevice structure of FIG. 2 showing acid diffused into an outer portionof the first resist material, causing the outer portion of the firstresist material to be chemically deprotected.

FIG. 4A is a partial cross-sectional side view of the semiconductordevice structure of FIG. 3 after the acid solution is removed from overand around the first resist material.

FIG. 4B is a partial cross-sectional top view of the semiconductordevice structure of FIG. 4A, taken along section line 4B-4B of FIG. 4A.

FIG. 5A is a partial cross-sectional side view of the semiconductordevice structure of FIG. 4A after a second resist material is formed onthe semiconductor device structure.

FIG. 5B is a partial cross-sectional top view of the semiconductordevice structure of FIG. 5A, taken along section line 5B-5B of FIG. 5A.

FIG. 6A is a partial cross-sectional side view of the semiconductordevice structure of FIG. 5A showing a portion of the first resistmaterial and a portion of the second resist material being exposed toradiation.

FIG. 6B is a partial cross-sectional top view of the semiconductordevice structure of FIG. 6A, taken along section line 6B-6B of FIG. 6A.

FIG. 7A is a partial cross-sectional side view of the semiconductordevice structure of FIG. 6A after the exposed portion of the firstresist material, the exposed portion of the second resist material, andthe deprotected portion of the first resist material is removed.

FIG. 7B is a partial cross-sectional top view of the semiconductordevice structure of FIG. 7A, taken along section line 7B-7B of FIG. 7A.

FIG. 8A is a partial cross-sectional side view of the semiconductordevice structure of FIG. 7A after portions of a substrate have beenremoved through a pattern in the first and second resist materials toform features in the substrate.

FIG. 8B is a partial cross-sectional top view of the semiconductordevice structure of FIG. 8A, taken along section line 8B-8B of FIG. 8A.

FIGS. 9 through 12 illustrate a method of forming a pattern in asemiconductor device structure according to another embodiment of thepresent disclosure.

FIG. 9 is a top view of a semiconductor device structure showing a firstresist material including at least one first portion that is relativelythinner than at least one second portion thereof.

FIG. 10 is a top view of the semiconductor device structure of FIG. 9after outer portions of the first resist material are chemicallydeprotected by a chemically active species, including the entire atleast one first portion.

FIG. 11 is a top view of the semiconductor device structure of FIG. 10after a second resist material is formed on the semiconductor devicestructure.

FIG. 12 is a top view of the semiconductor device structure of FIG. 11after the deprotected portion of the first resist material is removed.

DETAILED DESCRIPTION

As used herein, the term “substantially” in reference to a givenparameter means and includes to a degree that one of ordinary skill inthe art would understand that the given parameter, property, orcondition is met with a small degree of variance, such as withinacceptable manufacturing tolerances. By way of example, depending on theparticular parameter, property, or condition that is substantially met,the parameter, property, or condition may be at least 90% met, at least95% met, or even at least 99% met.

As used herein, any relational term, such as “first,” “second,” “over,”“on,” “underlying,” etc., is used for clarity and convenience inunderstanding the disclosure and accompanying drawings and does notconnote or depend on any specific preference, orientation, or order,except where the context clearly indicates otherwise.

As used herein, the phrase “semiconductor device structure” means andincludes any structure (e.g., wafer, die, substrate) of any shape andsize that includes intermediate or finished materials or structures usedin forming a semiconductor device, such as a memory device, an imagingdevice, a light emitting diode (LED) device, a processor device, a logicdevice, a micro-electromechanical system (MEMS) device, etc. In someembodiments, a semiconductor device structure of the present disclosuremay or may not include any semiconductor material, and may includenon-semiconductor materials (e.g., a metal material, a polymer material,a resist material, a ceramic material, etc.) used in forming asemiconductor device.

As used herein, the term “deprotect” and related terms mean and includea process in which a material protected from a chemical reaction ordissolution by a solvent, such as a developer solution, is chemicallymodified to become reactive or soluble in the solvent. The chemicalmodification may include a chemical reaction with at least onefunctional group bonded to the material. The terms “chemicallydeprotect” and “deprotect” may be used interchangeably herein.

Although the terms “soluble” and “insoluble” are used herein forsimplicity, these terms may be equated with “more soluble” and “lesssoluble,” respectively. Accordingly, a material that is “insoluble” in asolution may, in reality, be slightly soluble in the solution, while amaterial that is “soluble” in the solution may be soluble in thesolution to a higher degree than the insoluble material. Thus, as usedherein, the terms “soluble” and “insoluble” are relative and notabsolute terms.

The following description provides specific details, such as materialtypes and processing conditions, in order to provide a thoroughdescription of embodiments of the present disclosure. However, a personof ordinary skill in the art will understand that the embodiments of thepresent disclosure may be practiced without employing these specificdetails. Indeed, the embodiments of the present disclosure may bepracticed in conjunction with conventional semiconductor fabricationtechniques employed in the industry. In addition, the descriptionprovided below may not form a complete process flow for manufacturingsemiconductor devices. The structures described below do not formcomplete semiconductor devices. Only those process acts and structuresnecessary to understand embodiments of the present disclosure aredescribed in detail below. Additional acts to form completesemiconductor devices and systems may be performed by conventionalfabrication techniques. Accordingly, only the methods and semiconductordevice structures necessary to understand embodiments of the presentdisclosure are described herein.

In the following detailed description, reference is made to theaccompanying drawings, which form a part hereof, and in which is shown,by way of illustration, specific embodiments in which the presentdisclosure may be practiced. These embodiments are described insufficient detail to enable a person of ordinary skill in the art topractice the present disclosure. However, other embodiments may beutilized, and structural, process, and compositional changes may be madewithout departing from the scope of the disclosure. The illustrationspresented herein are not meant to be actual views of any particularsystem, device, structure, or memory cell, but are merely idealizedrepresentations that are employed to describe the embodiments of thepresent disclosure. The drawings presented herein are not necessarilydrawn to scale. Additionally, elements common between drawings mayretain the same numerical designation. However, any similarity innumbering does not mean that the structures or components arenecessarily identical in size, composition, configuration, or otherproperty.

The embodiments of the present disclosure include methods of formingpitch-doubled patterns using a so-called “anti-spacer” technique. Amongother operations, the methods include forming a first pattern in a firstphotosensitive resist material over a substrate, deprotecting a portionof the first photosensitive resist material with a chemically activespecies (e.g., by exposing the first photosensitive resist material toheat in the presence of an acid to diffuse the acid into a portion ofthe first photosensitive resist material, also referred to as an “acidbake”), forming a second photosensitive resist material over thesubstrate and between features of the first photosensitive resistmaterial, exposing portions of the first and second photosensitiveresist materials to radiation through a mask, and removing (e.g.,developing) the exposed portions of the first and second photosensitiveresist materials and the deprotected portions of the firstphotosensitive resist material. Such methods may be used to efficientlyform features of varying sizes and shapes in an underlying material,such as metal lines, pads, and/or traces in an array region of asemiconductor device. In some embodiments, the methods of the presentdisclosure may be used to form features for a memory device. Relativelycomplex, two-dimensional patterns may be formed using the methodsdisclosed herein at sizes (e.g., pitches) below those possible usingonly conventional photolithography techniques.

FIGS. 1A through 7B illustrate a method of forming a pattern in asemiconductor device structure according to an embodiment of the presentdisclosure.

Referring to FIGS. 1A and 1B, a portion of a semiconductor devicestructure 100 is shown that includes a substrate 101 and a patternedfirst resist material 104 formed over the substrate 101. The substrate101 may include a metal material 102 to be patterned, such as may beused to form electrically conductive lines, pads, and/or traces in anarray region of the semiconductor device structure 100. In someembodiments, one or more intermediate materials may, optionally, beformed between the first resist material 104 and the metal material 102of the substrate 101, such as an anti-reflective coating (e.g., a bottomanti-reflective coating, a dielectric anti-reflective coating (e.g.,silicon oxynitride or a hardmask material, such as a carbon or anorganic material), etc.), as is known in the art. In addition, thesubstrate 101 may include an active area 103 underlying the metalmaterial 102. The active area 103 may include other features,structures, and layers of various materials, such as a semiconductormaterial, transistors of a memory array, capacitors, electricallyconductive vias, electrical contacts, a dielectric material, etc. Theactive area 103 may be formed by conventional techniques, which are notdescribed in detail herein. The metal material 102 may be electricallycoupled to one or more of these features in the underlying active area103, for forming electrical pathways for providing functional access tothe features of the active area 103.

Although the present disclosure generally describes patterning a metalmaterial 102, the disclosure is not so limited. For example, the methodsof the present disclosure may be used to pattern an oxide material, asemiconductor material, a nitride material, or any other material of asubstrate.

Array regions of semiconductor device structures, such as structures formemory devices, generally include a large number of densely packed,repeated features, such as transistors, conductive lines, conductivepads, etc. The methods of the present disclosure may be used to formrelatively small features of array regions, although one of ordinaryskill in the art will recognize that the methods may also be used forforming features in other regions of semiconductor device structures,such as relatively larger features in peripheral regions.

The first resist material 104 may be formed over the substrate 101 andpatterned to form the pattern shown in FIGS. 1A and 1B. The first resistmaterial 104 may be a photosensitive material having a solubility in adeveloper solution that may be altered by exposure to an appropriateradiation (e.g., light of a certain wavelength), as is known in the artof photolithography. The first resist material 104 may be sensitive toradiation having a 248 nm wavelength, radiation having a 193 nmwavelength, or radiation having another particular wavelength. In someembodiments, the first resist material 104 may be a so-called “positivetone” resist, meaning that portions of the first resist material 104that are exposed to the appropriate radiation become soluble andremovable in the developer solution, while portions of the first resistmaterial 104 that are not exposed to the radiation remain insoluble inthe developer solution. The first resist material 104 may include amaterial that is more easily developed (e.g., that becomes soluble in adeveloper solution) when exposed to a chemically active species (e.g.,an acid or a base), such as a so-called “chemically amplified resist”material. Some chemically amplified resists may be formed by attachingfunctional groups to a resist to protect the resist from being solublewithin the developer solution. Such functional groups are also referredto herein as “protection groups.” A photoacid generator (PAG) (e.g., anonium salt) may be added to the chemically amplified resist. Exposure toappropriate radiation induces the PAG to generate an acid (i.e., achemically active species), which may react with the protection groupsto effect so-called “deprotection” of the resist. Thus, the deprotectedresist may be more soluble in the developer solution, while portions ofthe resist that have not undergone the deprotection reaction remainprotected by the protection groups and, therefore, remain insoluble inthe developer solution. The deprotection reaction may be facilitated byexposing the chemically amplified resist to heat. Additionally oralternatively, the deprotection reactions may take place using achemically active species that is not provided by a PAG, such as bydiffusing an acid or a base into the resist from a liquid solution. Somechemically amplified resists may undergo depolymerization when exposedto a chemically active species rather than, or in addition to,deprotection reactions.

By way of example and not limitation, the first resist material 104 mayinclude one or more of a methacrylate material (e.g., poly(methylmethacrylate) (PMMA)), an acrylate material (e.g.,poly(2,2,2-trifluoroethyl-chloroacrylate) (commercially available asEBR-9, for example)), a polyhydroxystyrene (PHOST) material with antert-butoxycarbonyl (tBOC) protection group (PBOCST), apoly[4-(2-hydroxyhexafluoroisopropyl)styrene] material with a tBOCprotection group, a poly(4-tert-butoxycarbonyloxystyrene) (PTBS)material with a tBOC protection group, apoly(4-t-butoxycarbonyloxystyrene-sulfone) (PTBSS) material, and apolyether material based on alkoxypyrimidine units. However, anyphotosensitive resist material more easily developed as a result ofexposure to a chemically active species may be used for the first resistmaterial 104.

The first resist material 104 may be soluble in a first solvent tofacilitate application of the first resist material 104 onto thesubstrate 101. For example, the first resist material 104 may applied tothe substrate 101 in liquid form (i.e., in a solution with the firstsolvent) using a spin-coating operation, after which the first resistmaterial 104 may be hardened by removal of the first solvent, such as byevaporating the first solvent from the first resist material 104 byapplication of heat, for example. The removal of the first solvent maysolidify the first resist material 104 to enable the first resistmaterial 104 to hold its shape when patterned.

The first solvent used depends on the particular material used for thefirst resist material 104. For example, if the first resist material 104is a PMMA material, then the first solvent may be propylene glycolmonomethyl ether acetate (PGMEA), methyl isobutyl ketone (MIBK),acetone, methyl ethyl ketone (MEK), N-methylpyrrolidone (NMP),chlorobenzene, ethylbenzene, ethyl lactate, etc., in which PMMA may besoluble. However, PMMA is not substantially soluble in isopropyl alcohol(IPA), ethanol, etc., and such solvents may not be used in theapplication of the first resist material 104 if the first resistmaterial 104 is a PMMA material.

Conventional photolithography techniques may be used to form the patternin the first resist material 104, as shown in FIGS. 1A and 1B. Forexample, after the first resist material 104 is formed over thesubstrate 101 and the first solvent is removed, the first resistmaterial 104 may be exposed to a pattern of radiation of an appropriatewavelength as directed through a mask (not shown) disposed over thefirst resist material 104. The mask may include transparent portionsthrough which the radiation may pass and opaque portions that block theradiation from passing. As mentioned above, portions of the first resistmaterial 104 exposed to the radiation may become soluble in a developersolution, while non-exposed portions of the first resist material 104may remain insoluble in the developer solution. In some embodiments, aso-called “post-exposure bake” (PEB) may be performed to subject thesemiconductor device structure 100 to an elevated temperature prior todeveloping and removing portions of the first resist material 104, as isknown in the art. The first resist material 104 may be subject todevelopment using a suitable developer solution, depending on theselected material of the first resist material 104. For example, thedeveloper solution may include tetramethylammonium hydroxide (TMAH),tetrabutylammonium hydroxide (TBAH), or an alkaline developer. Thedevelopment may remove the portions of the first resist material 104exposed to the radiation to form trenches 106 or other spaces betweenthe remaining portions of the first resist material 104, as shown inFIGS. 1A and 1B. The substrate 101 may be exposed (i.e., uncovered) inthe trenches 106 between remaining portions of the first resist material104.

Referring to FIG. 2, a chemically active species may be disposed overthe semiconductor device 100 proximate and in contact with the firstresist material 104. By way of example, an acid solution 108 may be usedto provide the chemically active species. For example, the acid solution108 may include one or more of triflic acid and perfluorobutanesulfonicacid (PFBS). The acid solution 108 may at least substantially fill thetrenches 106 between the portions of the first resist material 104 andmay cover top surfaces of the first resist material 104, as shown inFIG. 2. The acid solution 108 may be applied by conventional techniques,such as by spin-coating the acid solution 108 over the semiconductordevice structure 100.

Referring to FIG. 3, acid from the acid solution 108 may diffuse into anouter portion 110 of the first resist material 104, as represented byarrows 109, by exposing the semiconductor device structure 100 and theacid solution 108 to a predetermined temperature for a predeterminedtime sufficient to diffuse the acid into a desired volume (e.g., depth)of the first resist material 104. By way of example and not limitation,the predetermined temperature for diffusing the acid into the outerportion 110 of the first resist material 104 may be between about 80° C.and about 130° C., and the predetermined time may be between about 0.5minute and about 3 minutes. The temperature may facilitate anacid-catalyzed reaction that deprotects the outer portion 110 of thefirst resist material 104. The reaction may be controlled to leave aninner portion 112 of the first resist material 104 protected, such as byselecting an appropriate type of acid solution 108, predeterminedtemperature, and predetermined time. Thus, the solubility of the outerportion 110 of the first resist material 104 in a developer solution maybe altered, such that the outer portion 110 may be selectively removed(i.e., developed) relative to the inner portion 112 of the first resistmaterial 104. The outer portion 110 and the inner portion 112 are alsoreferred to herein as the deprotected portion 110 and the protectedportion 112, respectively.

A thickness T of the deprotected portion 110 may ultimately define awidth of spaces between features formed in the metal material 102 of thesubstrate 101, as will be explained in more detail below. Since thethickness T of the deprotected portion 110 is controlled by, forexample, controlling the temperature and/or time of acid diffusion intothe first resist material 104, the width of the spaces between thefeatures formed in the metal material 102 may be determined independentof, and potentially smaller than, the dimensional limits of conventionalphotolithography techniques.

Referring to FIGS. 4A and 4B, after diffusing acid into the first resistmaterial 104, the acid solution 108 (FIG. 3) remaining over thesemiconductor device structure 100 may be removed, such as by rinsingthe semiconductor device structure 100 in water, for example. At thispoint, the semiconductor device structure 100 may include the firstresist material 104 formed in a pattern over the substrate 101, with thesubstrate 101 being exposed (e.g., uncovered) through the trenches 106between portions of the first resist material 104. The deprotectedportion 110 of the first resist material 104 may extend along lateralsides of the first resist material 104 and may define sidewalls of thetrenches 106. The inner portion 112 of the first resist material 104 mayremain protected (i.e., insoluble in a developer solution).

Referring to FIGS. 5A and 5B, a second resist material 114 may bedisposed over the semiconductor device structure 100, such as within thetrenches 106 between the remaining portions of the first resist material104. Initially, the second resist material 114 may be dissolved in asecond solvent, such as to facilitate a spin-coating operation used todispose the second resist material 114 over the semiconductor devicestructure 100. At least the deprotected portion 110 of the first resistmaterial 104, or the entire first resist material 104, may be insolublein the second solvent. Thus, material of the second resist material 114may be selected to be soluble in the second solvent, which may bedifferent than the first solvent used for forming the first resistmaterial 104, in which at least the deprotected portion 110 of the firstresist material 104 may be soluble. The deprotected portion 110 of thefirst resist material 104 may be substantially insoluble in the secondsolvent, to enable the pattern formed by the first resist material 104to remain intact while the second resist material 114 is disposed in thetrenches 106. By way of example and not limitation, the first resistmaterial 104 may be selected to be soluble in PGMEA, cyclohexanone,and/or MIBK, and the second resist material 114 may be selected to besoluble in an alcohol-based solvent (e.g., decanol, IPA, ethanol), awater-based solvent, and/or anisole (methoxybenzene).

In addition, the second resist material 114 may be photosensitive toenable a pattern to be formed in the second resist material 114 usingconventional photolithographic techniques, as will be explained in moredetail below. In some embodiments, the second resist material 114 may besensitive to the same wavelength of radiation to which the first resistmaterial 104 is sensitive, such that both the first resist material 104and the second resist material 114 may be exposed to radiationsimultaneously through a single mask. For example, each of the first andsecond resist materials 104, 114 may be sensitive to radiation having a248 nm wavelength, radiation having a 193 nm wavelength, or radiationhaving another particular wavelength. In other embodiments, the secondresist material 114 may be sensitive to radiation having a differentwavelength compared to the first resist material 104. The second resistmaterial 114 may be a positive tone resist, as described above withreference to the first resist material 104.

Although the first and second resist materials 104, 114 are bothdescribed herein as positive tone resists, the present disclosure is notso limited. For example, in other embodiments, the first resist material104 may be a positive tone resist and the second resist material 114 maybe a negative tone resist, which is characterized as being insoluble ina developer solution after being exposed to an appropriate radiation,while portions thereof that have not been exposed to radiation aresoluble in the developer solution.

As mentioned above, the second resist material 114 may be formulated tobe developed in a developer solution after exposure to an appropriatewavelength of radiation. In some embodiments, the second resist material114 may be selected to be developed in the same developer solution asthe first resist material 104. For example, portions of each of thefirst and second resist materials 104, 114, along with the deprotectedportions 110 of the first resist material 104, may be developed andremoved by TMAH, TBAH, and/or an alkaline developer.

By way of example and not limitation, and depending on the materialselected for the first resist material 104 based on the criteriadescribed above (e.g., solubility, photosensitivity, and/or developmentrelative to the first resist material 104), the second resist material114 may include one or more of a methacrylate material (e.g., PMMA), apolyhydroxystyrene material, a poly(butene-1-sulfone) (PBS) material, anacrylate material (e.g., poly(2,2,2-trifluoroethyl-chloroacrylate)(commercially available as EBR-9, for example)), and a copolymer ofchloromethacrylate and methylstyrene (commercially available as ZEP-520,for example). The materials listed herein for the second resist material114 are offered by way of example only among a larger group ofcommercially available photoresist materials from which one of ordinaryskill in the art may choose given a particular application and given thematerial selected for the first resist material 104. Since the secondresist material 114 is to be chemically modified by exposure to lightand not necessarily by exposure to a chemically active species (e.g., anacid solution), the second resist material 114 need not be a chemicallyamplified resist material, although the second resist material 114 maybe a chemically amplified resist material in some embodiments.

After disposing the second resist material 114 over the semiconductordevice structure 100, at least a substantial portion of the secondsolvent may be removed from the second resist material 114. For example,the second resist material 114 may be subjected to an elevatedtemperature to facilitate evaporation of the second solvent from thesecond resist material 114.

As shown in FIGS. 5A and 5B, at this point the semiconductor devicestructure 100 may include alternating volumes of the first resistmaterial 104 and the second resist material 114. Each of the remainingportions of the first resist material 104 may include an inner,protected portion 112 and an outer, deprotected portion 110. Thedeprotected portions 110 may separate protected portions 112 of thefirst resist material 104 from adjacent portions of second resistmaterial 114.

Referring to FIGS. 6A and 6B, selected portions of the first resistmaterial 104 and of the second resist material 114 may be exposed toappropriate radiation, shown at arrows 115 in FIG. 6A, through at leastone mask (not shown). Since both the first resist material 104 and thesecond resist material 114 may be photosensitive, exposed portions 116(i.e., portions exposed to radiation) of the first resist material 104and exposed portions 118 (i.e., portions exposed to radiation) of thesecond resist material 114 may become soluble in a developer solutiondue to the exposure to the radiation. At least some of the exposedportions 116 of the first resist material 104 and at least some of theexposed portions 118 of the second resist material 114 may be located inan array region of the semiconductor device structure 100. Although notshown for simplicity, portions of the first resist material 104, of thesecond resist material 114, or both, in a peripheral region of thesemiconductor device structure 100 may also be exposed to the radiationthrough the mask for forming peripheral features of the semiconductordevice structure 100. The exposed portions 116, 118 of the first andsecond resist materials 104, 114 may be positioned in locations where agap (e.g., a break) in a feature is to be formed in the metal material102 of the substrate 101 underlying the first and second resistmaterials 104, 114. Thus, the exposed portions 116, 118 may bepositioned to isolate features to be formed in the metal material 102from each other.

As described above, in some embodiments, both the first and secondresist materials 104, 114 may be sensitive to the same wavelength ofradiation. In such embodiments, the first resist material 104 and thesecond resist material 114 may be simultaneously exposed to the samewavelength of radiation through a single mask.

After the exposure is complete, in some embodiments, a so-called“post-exposure bake” may be performed to subject the first and secondresist materials 104, 114 to an elevated temperature, as is known in theart. In some embodiments, the post-exposure bake may result in diffusionof acid from the deprotected portion 110 of the first resist material104 into the second resist material 114, which may result indeprotection of a portion of the second resist material 114 proximatethe first resist material 104.

Referring to FIGS. 7A and 7B in conjunction with FIGS. 6A and 6B, thefirst and second resist materials 104, 114 may be subject to developmentto remove the deprotected portions 110 of the first resist material 104,the exposed portions 116 of the first resist material 104, and theexposed portions 118 of the second resist material 114. Trenches 120 maybe formed where the deprotected portions 110 of the first resistmaterial 104 are removed, and gaps 122 may be formed where the exposedportions 116, 118 of the first and second resist material 104, 114 areremoved. The trenches 120 may have a width W_(T) (FIGS. 7A and 7B)defined by the thickness T (FIG. 3) of the deprotected portions 110 ofthe first resist material 104. Thus, the width W_(T) of the trenches 120may be independent of, and potentially smaller than, the resolutionlimits of conventional photolithography. The gaps 122 may have a widthW_(G) defined by the thickness T of two adjacent deprotected portions110 and a corresponding thickness of either a protected portion 112(FIGS. 6A and 6B) (which has been modified to be an exposed portion 116)or a portion of second resist material 114 (which has been modified tobe an exposed portion 118) between the adjacent deprotected portions110. Thus, the width W_(G) of the gaps 122 may be at least as wide asthe protected portions 112 of the first resist material 104 or as thetrenches 106 originally formed in the first resist material 104 byconventional photolithography (FIGS. 1A and 1B). Therefore, the widthW_(G) of the gaps 122 may be the same as or greater than the dimensionallimits of conventional photolithography. The metal material 102 of thesubstrate 101 may be exposed (i.e., uncovered) through the trenches 120and gaps 122.

As described above, in some embodiments, both the first and secondresist materials 104, 114 may be developed by the same developer, suchas TMAH, TBAH, and/or an alkaline developer. In such embodiments, asingle development operation using a single developer solution may beperformed to remove the deprotected portions 110 of the first resistmaterial 104 and the exposed portions 116, 118 of the first and secondresist materials 104, 114.

Referring to FIGS. 8A and 8B, portions of the metal material 102 (orother material to be patterned) exposed (i.e., uncovered) through thetrenches 120 and gaps 122 may be removed, such as by an etch operation(e.g., an anisotropic dry etch operation). Underlying portions of thesubstrate 101, such as the active area 103, may be exposed through thetrenches 120 and gaps 122. Portions of the metal material 102 covered bythe first and second resist materials 104, 114 may remain over theactive area 103. Thus, the pattern of the first and second resistmaterials 104, 114 may be transferred to the metal material 102 to form,for example, metal lines 124 and metal pads 126. In embodiments in whichthe material of the substrate 101 to be patterned is not a metalmaterial (e.g., an oxide material, a semiconductor material, a nitridematerial, etc.), transferring the pattern of the first and second resistmaterials 104, 114 to the material of the substrate 101 may formfeatures other than the metal lines 124 and metal pads 126. The gaps 122may electrically isolate portions of the metal material 102 on opposingsides of the gaps 122, such as above and below the gaps 122 in the viewof FIG. 8B. Thus, the gaps 122 may be used to isolate the metal lines124 or other features of the metal material 102 that would otherwise beconnected if the gaps 122 were not formed.

As shown in FIG. 8B, the metal lines 124 may have a width W_(L) definedby a corresponding width of remaining first resist material 104 orsecond resist material 114 between adjacent trenches 120. As explainedabove, the width W_(T) of the trenches 120 between adjacent metal lines124 and/or metal pads 126 may be defined by the thickness T of thedeprotected portions 110 of the first resist material 104 (FIG. 3).Since the width W_(T) of the trenches 120 is defined by controlling thesingle operation of diffusing a chemically active species into the firstresist material 104, each of the trenches 120 may have an at leastsubstantially uniform width W_(T). The uniformity of the width W_(T) ofthe trenches 120 between conductive features formed in the metalmaterial 102 may simplify compensating for electrical signal noiseand/or capacitance that may exist between adjacent metal lines 124and/or metal pads 126 during operation of a final semiconductor deviceformed from the semiconductor device structure 100.

After the metal material 102 is patterned by removing exposed (i.e.,uncovered) portions of the metal material 102, the first and secondresist materials 104, 114 may be at least substantially completelyremoved from over the metal material 102, such as by rinsing thesemiconductor device structure 100 in a suitable solvent for dissolvingthe remaining first and second resist materials 104, 114, by an abrasiveprocess (e.g., grinding), or by a so-called “plasma stripping”operation, for example. In addition, the trenches 120 and gaps 122between the metal lines 124 and metal pads 126 may be filled with aninsulating material to maintain electrical isolation between the metallines 124 and metal pads 126.

Accordingly, the present disclosure includes methods of forming apattern in a semiconductor device structure. In accordance with suchmethods, an outer portion of a first photosensitive resist material overa substrate may be deprotected with a chemically active species. Asecond photosensitive resist material may be formed over the substrate,and portions of the first and second photosensitive resist materials maybe exposed to radiation. The deprotected portion of the firstphotosensitive resist material and the exposed portions of the first andsecond photosensitive resist materials may be removed.

The present disclosure also includes methods of forming a semiconductordevice. In accordance with such methods, a first resist material isformed in a pattern over an array region of a substrate. The firstresist material includes an inner portion insoluble in a developersolution and an outer portion soluble in the developer solution. Asecond resist material is formed over the array region of the substrateand between adjacent portions of the first resist material. Portions ofthe first material over the array region are exposed to radiationsufficient to cause inner portions thereof to become soluble in thedeveloper solution. Portions of the second resist material over thearray region are exposed to radiation sufficient to cause portions ofthe second resist material to become soluble in the developer solution.The first and second resist materials are developed in the developersolution to remove the outer portion of the first resist material, theexposed inner portions of the first resist material, and the exposedportions of the second resist material.

FIGS. 9 through 12 illustrate a method of forming a pattern in asemiconductor device structure according to another embodiment of thepresent disclosure. In some embodiments, the pattern shown and describedwith reference to FIGS. 9 through 12 may be formed in an array region ofthe semiconductor device structure, although the methods described maybe applied to form patterns in a peripheral region, as will beunderstood by one of ordinary skill in the art.

Referring to FIG. 9, a first resist material 204 may be formed andpatterned over a substrate 201, essentially as described above withreference to patterning the first resist material 104 of FIGS. 1A and1B. However, the first resist material 204 may include at least onefirst portion 230 and at least one second portion 240. The particularlateral width of the at least one first portion 230 and of the at leastone second portion 240 may be determined given a particular application.In any case, the lateral width of the least one first portion 230 may besmaller than the lateral width of the at least one second portion 240.Both of the at least one first portion 230 and the at least one secondportion 240 may be defined by conventional photolithography techniques.The first resist material 204 may be a photosensitive material that issubject to deprotection by a chemically active species, as describedabove with reference to the first resist material 104 of FIGS. 1A and1B.

Referring to FIG. 10, a chemically active species, such as an acidsolution, may be disposed over the substrate 201 and proximate the firstresist material 204, essentially as described above with reference toFIGS. 2 through 4B. The chemically active species (e.g., an acid) may bediffused into portions of the first resist material 204, as representedby arrows 209. The acid solution may then be removed. In the at leastone second portion 240 of the first resist material 204, an outerportion 210 of the first resist material 204 may be deprotected (i.e.,become soluble in a developer solution) by the acid, while an innerportion 212 of the first resist material 204 may remain protected (i.e.,insoluble in the developer solution). However, in the at least one firstportion 230 of the first resist material 204, the acid may deprotect theentire first resist material 204, leaving no protected portion. Thus,the deprotected portion 210 of the first resist material 204 in the atleast one first portion 230 may extend all the way across and throughthe first resist material 204. The original lateral thickness of therelatively thin at least one first portion 230 may be selected to be nomore than two times the distance that the acid is intended to diffuseinto the first resist material 204. The deprotection reaction may becontrolled (such as by subjecting the structure to an appropriatetemperature and/or for an appropriate length of time) to entirelydeprotect the at least one first portion 230, while not entirelydeprotecting the at least one second portion 240.

Referring to FIG. 11, a second resist material 214 may be disposed overthe substrate 201 (FIG. 10) and adjacent to the first resist material204, essentially as described above with reference to FIGS. 5A and 5B.In some embodiments, the second resist material 214 may bephotosensitive, as described above with reference to FIGS. 5A and 5B.

Optionally, portions of one or both of the first resist material 204 andthe second resist material 214 (if the second resist material 214 isphotosensitive) may be exposed to radiation through a mask, essentiallyas described above with reference to FIGS. 6A and 6B. For example,portions of the second resist material 214 may be exposed to radiationfor forming gaps to isolate remaining portions of the second resistmaterial 214, as described above. In addition, portions of the firstand/or second resist material 204, 214 in a peripheral region may beexposed to radiation for forming peripheral features. In someembodiments, the second resist material 214 may be exposed to radiationthrough a mask, while the first resist material 204 is not exposedthrough a mask.

Referring to FIG. 12, the deprotected portions 210 (FIG. 11) of thefirst resist material 204 may be removed with a suitable developersolution to form trenches 220, essentially as described above withreference to FIGS. 7A and 7B. The protected portions 212 of the firstresist material 204 may remain after the development. Since the entireat least one first region 230 (FIG. 11) of the first resist material 204was deprotected, the entire at least one first region 230 may be removedin the developer solution, as shown in FIG. 12. Such a removal of the atleast one first region 230 may form a gap 222 that creates adiscontinuity in the first resist material 204 that isolates remainingportions of the first resist material 204 from each other. Optionally,if present, any portions of the first and second resist materials 204,214 exposed to radiation may also be removed by the development.

After the development and removal of the deprotected portions 210 (FIG.11) of the first resist material 204, portions of the substrate 201(e.g., portions of a metal material of the substrate 201) may beremoved, essentially as described above with reference to FIGS. 8A and8B. Features, such as lines, traces, and/or pads, may be formed in apattern that corresponds to the pattern of the first and second resistmaterials 204, 214.

Referring again to FIGS. 11 and 12, the relatively thin at least onefirst region 230 may be sized and configured to be at leastsubstantially completely removed, to isolate portions of the substrate201 underlying the first resist material 204 from each other. Thus,portions of the first resist material 204 may not need to be exposed toradiation through a mask to effect such an isolation. Accordingly,manufacturing complexity and time may be reduced compared toconventional methods that include an additional photolithographicprocess to isolate portions of the substrate 201. The method describedwith reference to FIGS. 9 through 12 may also be less expensive thanconventional methods that may use an additional mask to isolate portionsof the first resist material 204. In addition, masks must be properlyaligned with the pattern to position transparent portions of the masksover the desired locations where the first resist material 204 is to beexposed to radiation. Misalignment of the mask may cause a device formedby such methods to be inoperable due to incomplete or improper isolationof features. In some embodiments, the method of FIGS. 9 through 12 mayeliminate a risk of misalignment, since the additional mask may not benecessary to isolate portions of the first resist material 204.

Accordingly, the present disclosure includes additional methods offorming a pattern in a semiconductor device structure. In accordancewith such methods, a first resist material is formed over a substrate.The first resist material includes at least one first portion and atleast one second portion. The at least one first portion is relativelythinner than the at least one second portion. Substantially the entireat least one first portion is deprotected, and an outer portion of theat least one second portion of the first resist material is deprotected.An inner portion of the at least one second portion of the first resistmaterial is left protected. A second resist material is formed over thesubstrate, and at least one portion of the second resist material isexposed to radiation. The deprotected portions of the first resistmaterial and the exposed at least one portion of the second resistmaterial are removed.

Although the methods of the present disclosure have been described inthe context of forming metal features for a semiconductor device (e.g.,memory) array, one of ordinary skill in the art will recognize that themethods and their equivalents may be used to form other features forsemiconductor devices. For example, the methods of the presentdisclosure may be used to form any semiconductor device or structurethat is to include features smaller than the resolution limit ofconventional photolithography techniques. In addition, the featuresformed by the methods of the present disclosure may be metal features,dielectric features, semiconductor features, polymer features, ceramicfeatures, or intermediate or final features of any other material. Themethods of the present disclosure may also be used to form features thesame size as is possible with conventional photolithography techniques.

The methods of the present disclosure may provide an efficient processflow for creating small, pitch-multiplied features. In addition, thefeatures of the metal material formed by the methods of the presentdisclosure may be relatively flat and uniform since the features areformed by a subtractive metal etching process through a resist pattern.In other words, metal material is formed as a layer and is thenpatterned through the resist pattern, as opposed to filling trenches andgaps with metal material then removing excess metal material as may bethe case in some conventional methods. Thus, the methods of the presentdisclosure may avoid dishing and/or other problems associated with someconventional pitch-multiplication methods.

The embodiments of the disclosure described above and illustrated in theaccompanying drawing figures do not limit the scope of the invention,since these embodiments are merely examples of embodiments of theinvention, which is defined by the appended claims and their legalequivalents. Any equivalent embodiments are intended to be within thescope of this disclosure. Indeed, various modifications of the presentdisclosure, in addition to those shown and described herein, such asalternative useful combinations of the elements described, may becomeapparent to those of ordinary skill in the art upon considering thepresent disclosure. Such modifications and embodiments are also intendedto fall within the scope of the appended claims and their legalequivalents.

What is claimed is:
 1. A method of forming a pattern in a semiconductordevice structure, the method comprising: forming a patterned firstphotosensitive resist material over a substrate; forming a secondphotosensitive resist material over the substrate and over the patternedfirst photosensitive resist material; selectively exposing at least someof the patterned first photosensitive resist material through the secondphotosensitive resist material and at least some of the secondphotosensitive resist material to radiation; and selectively removingthe at least some of the patterned first photosensitive resist materialand the at least some of the second photosensitive resist materialexposed to the radiation with a developer solution.
 2. The method ofclaim 1, further comprising selecting the first photosensitive resistmaterial to comprise one or more of a tert-butoxycarbonyl group or apolyether material based on alkoxypyrimidine units.
 3. The method ofclaim 1, wherein forming the patterned first photosensitive resistmaterial over the substrate comprises exposing at least some of thefirst photosensitive resist material to another radiation through amask.
 4. The method of claim 3, further comprising contacting the atleast some of the first photosensitive resist material exposed to theanother radiation through the mask with a developer solution to formtrenches in the first photosensitive resist material.
 5. The method ofclaim 1, wherein forming the patterned first photosensitive resistmaterial over the substrate comprises forming a pattern in the firstphotosensitive resist material by photolithography.
 6. The method ofclaim 1, further comprising contacting the patterned firstphotosensitive resist material with an acid to form chemically modifiedouter portions of the first photosensitive resist material that are moresoluble in a developer solution than inner portions of the firstphotosensitive resist material that are unexposed to the acid.
 7. Themethod of claim 6, wherein contacting the patterned first photosensitiveresist material with the acid comprises diffusing one or more of triflicacid perfluorobutanesulfonic acid into the patterned firstphotosensitive resist material.
 8. The method of claim 6, whereincontacting the patterned first photosensitive resist material with theacid to form the chemically modified outer portions of the firstphotosensitive resist material comprises exposing the acid and thesemiconductor device structure to a temperature between about 80° C. andabout 130° C. to diffuse the acid into the patterned firstphotosensitive resist material.
 9. The method of claim 1, whereinforming the second photosensitive resist material over the substrate andover the patterned first photosensitive resist material comprisesforming the second photosensitive resist material between trenches ofthe first photosensitive resist material and over the patterned firstphotosensitive resist material.
 10. The method of claim 1, furthercomprising selecting the second photosensitive resist material tocomprise one or more of a methacrylate material, a polyhydroxystyrenematerial, a poly(butane-1-sulfone) material, an acrylate material, and acopolymer of chloromethacrylate and methylstyrene.
 11. The method ofclaim 1, wherein selectively exposing the at least some of the patternedfirst photosensitive resist material through the second photosensitiveresist material and the at least some of the second photosensitiveresist material to the radiation comprises simultaneously exposing theat least some of the patterned first photosensitive resist material andthe at least some of the second photosensitive resist material to theradiation through a mask.
 12. A method of forming a semiconductordevice, the method comprising: forming a patterned first resist materialon a substrate; exposing outer portions of the patterned first resistmaterial to an acid to form chemically modified outer portions of thepatterned first resist material; forming a second resist material overthe patterned first resist material; selectively exposing at least someof the patterned first resist material and at least some of the secondresist material to radiation; and removing, with a developer solution,the chemically modified outer portions of the patterned first resistmaterial, the at least some of the patterned first resist materialexposed to the radiation, and the at least some of the second resistmaterial exposed to the radiation.
 13. The method of claim 12, whereinselectively exposing the at least some of the patterned first resistmaterial to the radiation comprises exposing the at least some of thepatterned first resist material to the radiation through at least someof the chemically modified outer portions of the patterned first resistmaterial.
 14. The method of claim 12, further comprising formingtransferring a pattern to the substrate after the removing, with thedeveloper solution, the chemically modified outer portions of thepatterned first resist material, the at least some of the patternedfirst resist material exposed to the radiation, and the at least some ofthe second resist material exposed to the radiation.
 15. A method offorming a semiconductor device, the method comprising: forming apatterned first resist material comprising a first portion having asmaller lateral width than a second portion of the patterned firstresist material on a substrate; diffusing an acid through substantiallyall of the first portion of the patterned first resist material andthrough an outer portion of the second portion of the patterned firstresist material; forming a second resist material adjacent the firstportion of the patterned first resist material and the second portion ofthe patterned first resist material; and selectively removing the firstportion of the patterned first resist material, the outer portion of thesecond portion of the patterned first resist material, and at least aportion of the second resist material.
 16. The method of claim 15,wherein selectively removing the first portion of the patterned firstresist material, the outer portion of the second portion of thepatterned first resist material, and at least a portion of the secondresist material comprises exposing the first portion of the patternedfirst resist material, the outer portion of the second portion of thepatterned first resist material, and the at least a portion of thesecond resist material to radiation through a mask.
 17. The method ofclaim 15, further comprising transferring a pattern of the patternedfirst resist material and the second resist material to the substrateafter selectively removing the first portion of the patterned firstresist material, the outer portion of the second portion of thepatterned first resist material, and the at least the portion of thesecond resist material.